Advanced strain engineering for state-of-the-art nanoscale CMOS technology

Bin (Frank) Yang, Ming Cai. Advanced strain engineering for state-of-the-art nanoscale CMOS technology. Science in China Series F: Information Sciences, 54(5):946-958, 2011. [doi]

@article{YangC11-1,
  title = {Advanced strain engineering for state-of-the-art nanoscale CMOS technology},
  author = {Bin (Frank) Yang and Ming Cai},
  year = {2011},
  doi = {10.1007/s11432-011-4224-9},
  url = {http://dx.doi.org/10.1007/s11432-011-4224-9},
  researchr = {https://researchr.org/publication/YangC11-1},
  cites = {0},
  citedby = {0},
  journal = {Science in China Series F: Information Sciences},
  volume = {54},
  number = {5},
  pages = {946-958},
}