Nanometer-precision electron-beam lithography with applications in integrated optics

Jeffrey Todd Hastings. Nanometer-precision electron-beam lithography with applications in integrated optics. PhD thesis, Massachusetts Institute of Technology, Cambridge, MA, USA, 2003. [doi]

@phdthesis{ndltd-1018,
  title = {Nanometer-precision electron-beam lithography with applications in integrated optics},
  author = {Jeffrey Todd Hastings},
  year = {2003},
  url = {http://hdl.handle.net/1721.1/29949},
  note = {ndltd.org (oai:dspace.mit.edu:1721.1/29949)},
  researchr = {https://researchr.org/publication/ndltd-1018},
  cites = {0},
  citedby = {0},
  school = {Massachusetts Institute of Technology, Cambridge, MA, USA},
}