Brian Lee. Modeling of chemical mechanical polishing for shallow trench isolation. PhD thesis, Massachusetts Institute of Technology, Cambridge, MA, USA, 2002. [doi]
@phdthesis{ndltd-1423,
title = {Modeling of chemical mechanical polishing for shallow trench isolation},
author = {Brian Lee},
year = {2002},
url = {http://hdl.handle.net/1721.1/29907},
note = {ndltd.org (oai:dspace.mit.edu:1721.1/29907)},
researchr = {https://researchr.org/publication/ndltd-1423},
cites = {0},
citedby = {0},
school = {Massachusetts Institute of Technology, Cambridge, MA, USA},
}