Relaxation effects in MOS devices due to tunnel exchange with near-interface oxide traps

Theodore L. Tewksbury. Relaxation effects in MOS devices due to tunnel exchange with near-interface oxide traps. PhD thesis, Massachusetts Institute of Technology, Cambridge, MA, USA, 1992. [doi]

@phdthesis{ndltd-2084,
  title = {Relaxation effects in MOS devices due to tunnel exchange with near-interface oxide traps},
  author = {Theodore L. Tewksbury},
  year = {1992},
  url = {http://dspace.mit.edu/handle/1721.1/13238},
  note = {ndltd.org (oai:dspace.mit.edu:1721.1/13238)},
  researchr = {https://researchr.org/publication/ndltd-2084},
  cites = {0},
  citedby = {0},
  school = {Massachusetts Institute of Technology, Cambridge, MA, USA},
}