Comparison of electrical stress-induced charge carrier generation/trapping and related degradation of SiO::2:: and HfO::2::/SiO::2:: gate dielectric stacks - researchr publication

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Piyas Samanta, Chunxiang Zhu, Mansun Chan. Comparison of electrical stress-induced charge carrier generation/trapping and related degradation of SiO::2:: and HfO::2::/SiO::2:: gate dielectric stacks. In Microelectronics Reliability. pages 1907-1914, 2010. [doi]

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