Aris Magklaras 0001, Panayiotis Alefragis, Christos Gogos, Christos Valouxis, Alexios N. Birbas. A Genetic Algorithm-Enhanced Sensor Marks Selection Algorithm for Wavefront Aberration Modeling in Extreme-UV (EUV) Photolithography. Information, 14(8):428, 2023. [doi]
@article{0001AGVB23,
title = {A Genetic Algorithm-Enhanced Sensor Marks Selection Algorithm for Wavefront Aberration Modeling in Extreme-UV (EUV) Photolithography},
author = {Aris Magklaras 0001 and Panayiotis Alefragis and Christos Gogos and Christos Valouxis and Alexios N. Birbas},
year = {2023},
doi = {10.3390/info14080428},
url = {https://doi.org/10.3390/info14080428},
researchr = {https://researchr.org/publication/0001AGVB23},
cites = {0},
citedby = {0},
journal = {Information},
volume = {14},
number = {8},
pages = {428},
}