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A Genetic Algorithm-Enhanced Sensor Marks Selection Algorithm for Wavefront Aberration Modeling in Extreme-UV (EUV) Photolithography

Aris Magklaras 0001, Panayiotis Alefragis, Christos Gogos, Christos Valouxis, Alexios N. Birbas. A Genetic Algorithm-Enhanced Sensor Marks Selection Algorithm for Wavefront Aberration Modeling in Extreme-UV (EUV) Photolithography. Information, 14(8):428, 2023. [doi]

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