A study on flare minimisation in EUV lithography by post-layout re-allocation of wire segments

Sudipta Paul 0001, Pritha Banerjee, Susmita Sur-Kolay. A study on flare minimisation in EUV lithography by post-layout re-allocation of wire segments. IET Circuits, Devices & Systems, 15(4):310-329, 2021. [doi]

Abstract

Abstract is missing.