Robust control of rapid thermal processes applied to vapor deposition processing - researchr publication authors

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Stanislav Aranovskiy, Aleksandr A. Kapitonov, Alexey A. Bobtsov, Anton A. Pyrkin, Evgeny Zavarin, Denis Davydov, Romeo Ortega. Robust control of rapid thermal processes applied to vapor deposition processing. In 6th International Congress on Ultra Modern Telecommunications and Control Systems and Workshops, ICUMT 2014, St. Petersburg, Russia, October 6-8, 2014. pages 578-583, IEEE, 2014. [doi]

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