Patterning Nanometer Resist Features on Planar and Topography Substrates Using The 2-Step NERIME FIB Top Surface Imaging Process

Khalil Arshak, Stephen F. Gilmartin, Damian Collins, Olga Korostynska, Arous Arshak. Patterning Nanometer Resist Features on Planar and Topography Substrates Using The 2-Step NERIME FIB Top Surface Imaging Process. In 2005 International Conference on MEMS, NANO, and Smart Systems (ICMENS 2005), 24-27 July 2005, Banff, Alberta, Canada. pages 159-166, IEEE Computer Society, 2005. [doi]

Abstract

Abstract is missing.