Effects of the metal gate on the stress-induced traps in Ta::2::O::5::/SiO::2:: stacks

E. Atanassova, Albena Paskaleva, N. Novkovski. Effects of the metal gate on the stress-induced traps in Ta::2::O::5::/SiO::2:: stacks. Microelectronics Reliability, 48(4):514-525, 2008. [doi]

Abstract

Abstract is missing.