Chris Auth. 45nm high-k + metal gate strain-enhanced CMOS transistors. In Proceedings of the IEEE 2008 Custom Integrated Circuits Conference, CICC 2008, DoubleTree Hotel, San Jose, California, USA, September 21-24, 2008. pages 379-386, IEEE, 2008. [doi]
@inproceedings{Auth08,
title = {45nm high-k + metal gate strain-enhanced CMOS transistors},
author = {Chris Auth},
year = {2008},
doi = {10.1109/CICC.2008.4672101},
url = {http://dx.doi.org/10.1109/CICC.2008.4672101},
researchr = {https://researchr.org/publication/Auth08},
cites = {0},
citedby = {0},
pages = {379-386},
booktitle = {Proceedings of the IEEE 2008 Custom Integrated Circuits Conference, CICC 2008, DoubleTree Hotel, San Jose, California, USA, September 21-24, 2008},
publisher = {IEEE},
isbn = {978-1-4244-2018-6},
}