Seunghun Baik, Dong-Jae Kwon, Hongki Kang, Jae Eun Jang, Jaewon Jang, Y. S. Kim, Hyuk-jun Kwon. Conformal and Ultra Shallow Junction Formation Achieved Using a Pulsed-Laser Annealing Process Integrated With a Modified Plasma Assisted Doping Method. IEEE Access, 8:172166-172174, 2020. [doi]
@article{BaikKKJJKK20,
title = {Conformal and Ultra Shallow Junction Formation Achieved Using a Pulsed-Laser Annealing Process Integrated With a Modified Plasma Assisted Doping Method},
author = {Seunghun Baik and Dong-Jae Kwon and Hongki Kang and Jae Eun Jang and Jaewon Jang and Y. S. Kim and Hyuk-jun Kwon},
year = {2020},
doi = {10.1109/ACCESS.2020.3024636},
url = {https://doi.org/10.1109/ACCESS.2020.3024636},
researchr = {https://researchr.org/publication/BaikKKJJKK20},
cites = {0},
citedby = {0},
journal = {IEEE Access},
volume = {8},
pages = {172166-172174},
}