Study of reverse substrate bias effect of 22nm node epitaxial delta doped channel MOS transistor for low power SoC applications - researchr publication authors

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Debayan Bairagi, Soumya Pandit. Study of reverse substrate bias effect of 22nm node epitaxial delta doped channel MOS transistor for low power SoC applications. In 18th International Symposium on VLSI Design and Test, VDAT 2014, Coimbatore, India, July 16-18, 2014. pages 1-6, IEEE, 2014. [doi]

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