Modelling and measurements of thermomechanical stress induced drift on polysilicon resistors with different layout

Lorenzo Benvenuti, Paolo Bruschi, Luca Fanucci, Raffaele Coppeta, Sara Carniello, Luigi Di Piro, Francesco Tinfena. Modelling and measurements of thermomechanical stress induced drift on polysilicon resistors with different layout. In 14th International Conference on Design & Technology of Integrated Systems In Nanoscale Era, DTIS 2019, Mykonos, Greece, April 16-18, 2019. pages 1-5, IEEE, 2019. [doi]

@inproceedings{BenvenutiBFCCPT19,
  title = {Modelling and measurements of thermomechanical stress induced drift on polysilicon resistors with different layout},
  author = {Lorenzo Benvenuti and Paolo Bruschi and Luca Fanucci and Raffaele Coppeta and Sara Carniello and Luigi Di Piro and Francesco Tinfena},
  year = {2019},
  doi = {10.1109/DTIS.2019.8734970},
  url = {https://doi.org/10.1109/DTIS.2019.8734970},
  researchr = {https://researchr.org/publication/BenvenutiBFCCPT19},
  cites = {0},
  citedby = {0},
  pages = {1-5},
  booktitle = {14th International Conference on Design & Technology of Integrated Systems In Nanoscale Era, DTIS 2019, Mykonos, Greece, April 16-18, 2019},
  publisher = {IEEE},
  isbn = {978-1-7281-3424-6},
}