Influence of fluorine-based dry etching on electrical parameters of AlGaN/GaN-on-Si High Electron Mobility Transistors

D. Bisi, Matteo Meneghini, A. Stocco, G. Cibin, A. Pantellini, A. Nanni, Claudio Lanzieri, Enrico Zanoni, Gaudenzio Meneghesso. Influence of fluorine-based dry etching on electrical parameters of AlGaN/GaN-on-Si High Electron Mobility Transistors. In Proceedings of the European Solid-State Device Research Conference, ESSDERC 2013, Bucharest, Romania, September 16-20, 2013. pages 61-64, IEEE, 2013. [doi]

@inproceedings{BisiMSCPNLZM13,
  title = {Influence of fluorine-based dry etching on electrical parameters of AlGaN/GaN-on-Si High Electron Mobility Transistors},
  author = {D. Bisi and Matteo Meneghini and A. Stocco and G. Cibin and A. Pantellini and A. Nanni and Claudio Lanzieri and Enrico Zanoni and Gaudenzio Meneghesso},
  year = {2013},
  doi = {10.1109/ESSDERC.2013.6818819},
  url = {http://dx.doi.org/10.1109/ESSDERC.2013.6818819},
  researchr = {https://researchr.org/publication/BisiMSCPNLZM13},
  cites = {0},
  citedby = {0},
  pages = {61-64},
  booktitle = {Proceedings of the European Solid-State Device Research Conference, ESSDERC 2013, Bucharest, Romania, September 16-20, 2013},
  publisher = {IEEE},
}