G. Borsoni, N. Béchu, M. Gros-Jean, M. L. Korwin-Pawlowski, R. Laffitte, V. Le Roux, L. Vallier, N. Rochat, C. Wyon. Ultra-thin oxides on silicon fabricated using ultra-slow multicharged ion beams. Microelectronics Reliability, 41(7):1063-1066, 2001. [doi]
@article{BorsoniBGKLRVRW01,
title = {Ultra-thin oxides on silicon fabricated using ultra-slow multicharged ion beams},
author = {G. Borsoni and N. Béchu and M. Gros-Jean and M. L. Korwin-Pawlowski and R. Laffitte and V. Le Roux and L. Vallier and N. Rochat and C. Wyon},
year = {2001},
doi = {10.1016/S0026-2714(01)00076-2},
url = {http://dx.doi.org/10.1016/S0026-2714(01)00076-2},
tags = {C++},
researchr = {https://researchr.org/publication/BorsoniBGKLRVRW01},
cites = {0},
citedby = {0},
journal = {Microelectronics Reliability},
volume = {41},
number = {7},
pages = {1063-1066},
}