Ultra-thin oxides on silicon fabricated using ultra-slow multicharged ion beams

G. Borsoni, N. Béchu, M. Gros-Jean, M. L. Korwin-Pawlowski, R. Laffitte, V. Le Roux, L. Vallier, N. Rochat, C. Wyon. Ultra-thin oxides on silicon fabricated using ultra-slow multicharged ion beams. Microelectronics Reliability, 41(7):1063-1066, 2001. [doi]

Abstract

Abstract is missing.