AFFCCA: a tool for critical area analysis with circular defects and lithography deformed layout - researchr publication authors

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Igor Bubel, Wojciech Maly, Thomas Waas, Pranab K. Nag, Hans Hartmann, Doris Schmitt-Landsiedel, Susanne Griep. AFFCCA: a tool for critical area analysis with circular defects and lithography deformed layout. In 1995 IEEE International Symposium on Defect and Fault Tolerance in VLSI and Nanotechnology Systems, DFT 1995, Lafayette, LA, USA, November 13-15, 1995. pages 10-18, IEEE Computer Society, 1995. [doi]

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