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Development and application of a new tool for lithographic mask evaluation, the stepper equivalent Aerial Image Measurement System, AIMS

Russell A. Budd, Derek B. Dove, John L. Staples, Ronald M. Martino, Richard A. Ferguson, J. Tracy Weed. Development and application of a new tool for lithographic mask evaluation, the stepper equivalent Aerial Image Measurement System, AIMS. IBM Journal of Research and Development, 41(1&2):119-130, 1997. [doi]

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