Dimensional control in corner lithography for wafer-scale fabrication of nano-apertures - researchr publication authors

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Narges Burouni, Erwin Berenschot, Miko Elwenspoek, Niels Tas. Dimensional control in corner lithography for wafer-scale fabrication of nano-apertures. In 6th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2011, Kaohsiung, Taiwan, February 20-23, 2011. pages 940-943, IEEE, 2011. [doi]

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