Narges Burouni, Erwin Berenschot, Miko Elwenspoek, Niels Tas. Dimensional control in corner lithography for wafer-scale fabrication of nano-apertures. In 6th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2011, Kaohsiung, Taiwan, February 20-23, 2011. pages 940-943, IEEE, 2011. [doi]
@inproceedings{BurouniBET11,
title = {Dimensional control in corner lithography for wafer-scale fabrication of nano-apertures},
author = {Narges Burouni and Erwin Berenschot and Miko Elwenspoek and Niels Tas},
year = {2011},
doi = {10.1109/NEMS.2011.6017509},
url = {http://dx.doi.org/10.1109/NEMS.2011.6017509},
researchr = {https://researchr.org/publication/BurouniBET11},
cites = {0},
citedby = {0},
pages = {940-943},
booktitle = {6th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2011, Kaohsiung, Taiwan, February 20-23, 2011},
publisher = {IEEE},
}