P. J. Byrne, Cathal Heavey, Kamil Erkan Kabak. An analysis of tool capabilities in the photolithography area of an ASIC fab. In Shane G. Henderson, Bahar Biller, Ming-Hua Hsieh, John Shortle, Jeffrey D. Tew, Russell R. Barton, editors, Proceedings of the Winter Simulation Conference, WSC 2007, Washington, DC, USA, December 9-12, 2007. pages 1761-1767, WSC, 2007. [doi]
@inproceedings{ByrneHK07,
title = {An analysis of tool capabilities in the photolithography area of an ASIC fab},
author = {P. J. Byrne and Cathal Heavey and Kamil Erkan Kabak},
year = {2007},
doi = {10.1145/1351542.1351858},
url = {http://doi.acm.org/10.1145/1351542.1351858},
tags = {analysis},
researchr = {https://researchr.org/publication/ByrneHK07},
cites = {0},
citedby = {0},
pages = {1761-1767},
booktitle = {Proceedings of the Winter Simulation Conference, WSC 2007, Washington, DC, USA, December 9-12, 2007},
editor = {Shane G. Henderson and Bahar Biller and Ming-Hua Hsieh and John Shortle and Jeffrey D. Tew and Russell R. Barton},
publisher = {WSC},
isbn = {1-4244-1306-0},
}