Effect of High-k Passivation Layer on Electrical Properties of GaN Metal-Insulator-Semiconductor Devices

Yutao Cai, Yang Wang, Miao Cui, Wen Liu, Huiqing Wen, Cezhou Zhao, Ivona Z. Mitrovic, Stephen Taylor, Paul R. Chalker. Effect of High-k Passivation Layer on Electrical Properties of GaN Metal-Insulator-Semiconductor Devices. In International Conference on IC Design and Technology, ICICDT 2019, Suzhou, China, June 17-19, 2019. pages 1-5, IEEE, 2019. [doi]

Authors

Yutao Cai

This author has not been identified. Look up 'Yutao Cai' in Google

Yang Wang

This author has not been identified. Look up 'Yang Wang' in Google

Miao Cui

This author has not been identified. Look up 'Miao Cui' in Google

Wen Liu

This author has not been identified. Look up 'Wen Liu' in Google

Huiqing Wen

This author has not been identified. Look up 'Huiqing Wen' in Google

Cezhou Zhao

This author has not been identified. Look up 'Cezhou Zhao' in Google

Ivona Z. Mitrovic

This author has not been identified. Look up 'Ivona Z. Mitrovic' in Google

Stephen Taylor

This author has not been identified. Look up 'Stephen Taylor' in Google

Paul R. Chalker

This author has not been identified. Look up 'Paul R. Chalker' in Google