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Sub-electron CIS noise analysis in 65 nm process

Raffaele Capoccia, Assim Boukhayma, Christian Enz. Sub-electron CIS noise analysis in 65 nm process. In 2016 IEEE International Conference on Electronics, Circuits and Systems, ICECS 2016, Monte Carlo, Monaco, December 11-14, 2016. pages 560-563, IEEE, 2016. [doi]

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