An investigation of capacitance aging model for extreme low-k and high-k dielectrics

M. N. Chang, Y. H. Lee, S. Y. Lee, C.-C. Chiu, D. Maji, K. Wu. An investigation of capacitance aging model for extreme low-k and high-k dielectrics. In IEEE International Reliability Physics Symposium, IRPS 2015, Monterey, CA, USA, April 19-23, 2015. pages 3, IEEE, 2015. [doi]

Abstract

Abstract is missing.