R. Charavel, J. Roig, S. Mouhoubi, P. Gassot, F. Bauwens, P. Vanmeerbeek, B. Desoete, P. Moens, Eddy De Backer. Next generation of Deep Trench Isolation for Smart Power technologies with 120 V high-voltage devices. Microelectronics Reliability, 50(9-11):1758-1762, 2010. [doi]
@article{CharavelRMGBVDMB10,
title = {Next generation of Deep Trench Isolation for Smart Power technologies with 120 V high-voltage devices},
author = {R. Charavel and J. Roig and S. Mouhoubi and P. Gassot and F. Bauwens and P. Vanmeerbeek and B. Desoete and P. Moens and Eddy De Backer},
year = {2010},
doi = {10.1016/j.microrel.2010.07.117},
url = {http://dx.doi.org/10.1016/j.microrel.2010.07.117},
researchr = {https://researchr.org/publication/CharavelRMGBVDMB10},
cites = {0},
citedby = {0},
journal = {Microelectronics Reliability},
volume = {50},
number = {9-11},
pages = {1758-1762},
}