Stress immunity enhancement of the SiN uniaxial strained n-channel metal-oxide-semiconductor field-effect-transistor by channel fluorine implantation

Yung-Yu Chen, Chih-Ren Hsieh, Fang-Yu Chiu. Stress immunity enhancement of the SiN uniaxial strained n-channel metal-oxide-semiconductor field-effect-transistor by channel fluorine implantation. Microelectronics Reliability, 52(6):995-998, 2012. [doi]

Abstract

Abstract is missing.