Effect of gate trench fabrication technology on reliability of AlGaN/GaN heterojunction field effect transistors

Sergey A. Chevtchenko, Matthias Schulz, Eldad Bahat-Treidel, Wilfred John, Stephan Freyer, Paul Kurpas, Joachim Würfl. Effect of gate trench fabrication technology on reliability of AlGaN/GaN heterojunction field effect transistors. Microelectronics Reliability, 54(9-10):2191-2195, 2014. [doi]

@article{ChevtchenkoSBJF14,
  title = {Effect of gate trench fabrication technology on reliability of AlGaN/GaN heterojunction field effect transistors},
  author = {Sergey A. Chevtchenko and Matthias Schulz and Eldad Bahat-Treidel and Wilfred John and Stephan Freyer and Paul Kurpas and Joachim Würfl},
  year = {2014},
  doi = {10.1016/j.microrel.2014.07.046},
  url = {http://dx.doi.org/10.1016/j.microrel.2014.07.046},
  researchr = {https://researchr.org/publication/ChevtchenkoSBJF14},
  cites = {0},
  citedby = {0},
  journal = {Microelectronics Reliability},
  volume = {54},
  number = {9-10},
  pages = {2191-2195},
}