Impact of Chamber/Annealing Temperature on the Endurance Characteristic of Zr: HfO2 Ferroelectric Capacitor

Yejoo Choi, Changwoo Han, Jaemin Shin, Seungjun Moon, Jinhong Min, Hyeonjung Park, Deokjoon Eom, Jehoon Lee, Changhwan Shin. Impact of Chamber/Annealing Temperature on the Endurance Characteristic of Zr: HfO2 Ferroelectric Capacitor. Sensors, 22(11):4087, 2022. [doi]

@article{ChoiHSMMPELS22,
  title = {Impact of Chamber/Annealing Temperature on the Endurance Characteristic of Zr: HfO2 Ferroelectric Capacitor},
  author = {Yejoo Choi and Changwoo Han and Jaemin Shin and Seungjun Moon and Jinhong Min and Hyeonjung Park and Deokjoon Eom and Jehoon Lee and Changhwan Shin},
  year = {2022},
  doi = {10.3390/s22114087},
  url = {https://doi.org/10.3390/s22114087},
  researchr = {https://researchr.org/publication/ChoiHSMMPELS22},
  cites = {0},
  citedby = {0},
  journal = {Sensors},
  volume = {22},
  number = {11},
  pages = {4087},
}