Min-Ching Chu, Jagan Singh Meena, Chih-Chia Cheng, Hsin-Chiang You, Feng-Chih Chang, Fu-Hsiang Ko. Plasma-enhanced flexible metal-insulator-metal capacitor using high-k ZrO::2:: film as gate dielectric with improved reliability. Microelectronics Reliability, 50(8):1098-1102, 2010. [doi]
Abstract is missing.