Electrical characterization and quantum modeling of MOS capacitors with ultra-thin oxides (1.4-3 nm)

R. Clerc, A. S. Spinelli, G. Ghibaudo, C. Leroux, G. Pananakakis. Electrical characterization and quantum modeling of MOS capacitors with ultra-thin oxides (1.4-3 nm). Microelectronics Reliability, 41(7):1027-1030, 2001. [doi]

@article{ClercSGLP01,
  title = {Electrical characterization and quantum modeling of MOS capacitors with ultra-thin oxides (1.4-3 nm)},
  author = {R. Clerc and A. S. Spinelli and G. Ghibaudo and C. Leroux and G. Pananakakis},
  year = {2001},
  doi = {10.1016/S0026-2714(01)00063-4},
  url = {http://dx.doi.org/10.1016/S0026-2714(01)00063-4},
  tags = {modeling, C++},
  researchr = {https://researchr.org/publication/ClercSGLP01},
  cites = {0},
  citedby = {0},
  journal = {Microelectronics Reliability},
  volume = {41},
  number = {7},
  pages = {1027-1030},
}