Ismael Cosme, Andrey Kosarev, F. Temoltzi, A. Itzmoyotl. Study of doping of Ge0.96Si0.04: H films with B, and P during low frequency plasma deposition at low temperature. In 8th International Conference on Electrical Engineering, Computing Science and Automatic Control, CCE 2011, Merida City, Mexico, October 26-28, 2011. pages 1-3, IEEE, 2011. [doi]
Abstract is missing.