Study of copper drift during TDDB of intermetal dielectrics by using fully passivated MOS capacitors as test vehicle

Kristof Croes, G. Cannatá, L. Zhao, Zsolt Tokei. Study of copper drift during TDDB of intermetal dielectrics by using fully passivated MOS capacitors as test vehicle. Microelectronics Reliability, 48(8-9):1384-1387, 2008. [doi]

Abstract

Abstract is missing.