Development of a permittivity extraction method for ultra low k dielectrics integrated in advanced interconnects

O. Cueto, Myriam Assous, François de Crecy, A. Toffoli, David Bouchu, M. Fayolle, Frédéric Boulanger. Development of a permittivity extraction method for ultra low k dielectrics integrated in advanced interconnects. Microelectronics Reliability, 47(4-5):769-772, 2007. [doi]

Authors

O. Cueto

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Myriam Assous

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François de Crecy

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A. Toffoli

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David Bouchu

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M. Fayolle

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Frédéric Boulanger

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