Development of a permittivity extraction method for ultra low k dielectrics integrated in advanced interconnects

O. Cueto, Myriam Assous, François de Crecy, A. Toffoli, David Bouchu, M. Fayolle, Frédéric Boulanger. Development of a permittivity extraction method for ultra low k dielectrics integrated in advanced interconnects. Microelectronics Reliability, 47(4-5):769-772, 2007. [doi]

Abstract

Abstract is missing.