Wei Dai, Fei Chu, Chunyu Yang, Ying Chen, Tianyou Chai. Software platform for optimal setting control of complex industrial processes. In 2017 American Control Conference, ACC 2017, Seattle, WA, USA, May 24-26, 2017. pages 4809-4814, IEEE, 2017. [doi]
@inproceedings{DaiCYCC17,
title = {Software platform for optimal setting control of complex industrial processes},
author = {Wei Dai and Fei Chu and Chunyu Yang and Ying Chen and Tianyou Chai},
year = {2017},
doi = {10.23919/ACC.2017.7963699},
url = {https://doi.org/10.23919/ACC.2017.7963699},
researchr = {https://researchr.org/publication/DaiCYCC17},
cites = {0},
citedby = {0},
pages = {4809-4814},
booktitle = {2017 American Control Conference, ACC 2017, Seattle, WA, USA, May 24-26, 2017},
publisher = {IEEE},
isbn = {978-1-5090-5992-8},
}