Charge trapping and reliability characteristics of ultra-thin HfYO::x:: films on n-GaAs substrates

P. S. Das, A. Biswas. Charge trapping and reliability characteristics of ultra-thin HfYO::x:: films on n-GaAs substrates. In Microelectronics Reliability. pages 1924-1930, 2010. [doi]

@inproceedings{DasB10-6,
  title = {Charge trapping and reliability characteristics of ultra-thin HfYO::x:: films on n-GaAs substrates},
  author = {P. S. Das and A. Biswas},
  year = {2010},
  doi = {10.1016/j.microrel.2010.07.009},
  url = {http://dx.doi.org/10.1016/j.microrel.2010.07.009},
  tags = {reliability},
  researchr = {https://researchr.org/publication/DasB10-6},
  cites = {0},
  citedby = {0},
  pages = {1924-1930},
  booktitle = {Microelectronics Reliability},
}