Ying-Jun Deng, Hao-Lun Hu, Yu-Han Liang, Jian-Ming Chen, Ching-Chuan Chou, Shea-Jue Wang, Mu-Chun Wang. Q-factor Integrity of 28nm-node High-k Gate Dielectric. In 3rd IEEE International Conference on Knowledge Innovation and Invention, ICKII 2020, Kaohsiung, Taiwan, August 21-23, 2020. pages 71-73, IEEE, 2020. [doi]
@inproceedings{DengHLCCWW20,
title = {Q-factor Integrity of 28nm-node High-k Gate Dielectric},
author = {Ying-Jun Deng and Hao-Lun Hu and Yu-Han Liang and Jian-Ming Chen and Ching-Chuan Chou and Shea-Jue Wang and Mu-Chun Wang},
year = {2020},
doi = {10.1109/ICKII50300.2020.9318772},
url = {https://doi.org/10.1109/ICKII50300.2020.9318772},
researchr = {https://researchr.org/publication/DengHLCCWW20},
cites = {0},
citedby = {0},
pages = {71-73},
booktitle = {3rd IEEE International Conference on Knowledge Innovation and Invention, ICKII 2020, Kaohsiung, Taiwan, August 21-23, 2020},
publisher = {IEEE},
isbn = {978-1-7281-9333-5},
}