Q-factor Integrity of 28nm-node High-k Gate Dielectric

Ying-Jun Deng, Hao-Lun Hu, Yu-Han Liang, Jian-Ming Chen, Ching-Chuan Chou, Shea-Jue Wang, Mu-Chun Wang. Q-factor Integrity of 28nm-node High-k Gate Dielectric. In 3rd IEEE International Conference on Knowledge Innovation and Invention, ICKII 2020, Kaohsiung, Taiwan, August 21-23, 2020. pages 71-73, IEEE, 2020. [doi]

Abstract

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