Benjamin Stefan Devlin, Makoto Ikeda, Kunihiro Asada. Gate-level process variation offset technique by using dual voltage supplies to achieve near-threshold energy efficient operation. In Hiroaki Kobayashi, Makoto Ikeda, Fumio Arakawa, editors, 2012 IEEE Symposium on Low-Power and High-Speed Chips, COOL Chips XV, Yokohama, Japan, April 18-20, 2012. pages 1-3, IEEE, 2012. [doi]
@inproceedings{DevlinIA12-1,
title = {Gate-level process variation offset technique by using dual voltage supplies to achieve near-threshold energy efficient operation},
author = {Benjamin Stefan Devlin and Makoto Ikeda and Kunihiro Asada},
year = {2012},
doi = {10.1109/COOLChips.2012.6216585},
url = {http://dx.doi.org/10.1109/COOLChips.2012.6216585},
researchr = {https://researchr.org/publication/DevlinIA12-1},
cites = {0},
citedby = {0},
pages = {1-3},
booktitle = {2012 IEEE Symposium on Low-Power and High-Speed Chips, COOL Chips XV, Yokohama, Japan, April 18-20, 2012},
editor = {Hiroaki Kobayashi and Makoto Ikeda and Fumio Arakawa},
publisher = {IEEE},
isbn = {978-1-4673-1201-1},
}