Self-aligned double patterning-aware detailed routing with double via insertion and via manufacturability consideration - researchr publication authors

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Yixiao Ding, Chris C. N. Chu, Wai-Kei Mak. Self-aligned double patterning-aware detailed routing with double via insertion and via manufacturability consideration. In Proceedings of the 53rd Annual Design Automation Conference, DAC 2016, Austin, TX, USA, June 5-9, 2016. pages 42, ACM, 2016. [doi]

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