Yixiao Ding, Chris Chu, Wai-Kei Mak. Self-Aligned Double Patterning Lithography Aware Detailed Routing With Color Preassignment. IEEE Trans. on CAD of Integrated Circuits and Systems, 36(8):1381-1394, 2017. [doi]
@article{DingCM17-0,
title = {Self-Aligned Double Patterning Lithography Aware Detailed Routing With Color Preassignment},
author = {Yixiao Ding and Chris Chu and Wai-Kei Mak},
year = {2017},
doi = {10.1109/TCAD.2016.2622625},
url = {https://doi.org/10.1109/TCAD.2016.2622625},
researchr = {https://researchr.org/publication/DingCM17-0},
cites = {0},
citedby = {0},
journal = {IEEE Trans. on CAD of Integrated Circuits and Systems},
volume = {36},
number = {8},
pages = {1381-1394},
}