A BIST structure for the evaluation of the MOSFET gate dielectric interface state density in post-processed CMOS chips - researchr publication authors

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Norman Dodel, Stefan Keil, Andreas Wiemhofer, Malte Kortstock, Philipp Scholz, Uwe Kerst, Roland Thewes. A BIST structure for the evaluation of the MOSFET gate dielectric interface state density in post-processed CMOS chips. In Wolfgang Pribyl, Franz Dielacher, Gernot Hueber, editors, st European Solid-State Circuits Conference, Graz, Austria, September 14-18, 2015. pages 412-415, IEEE, 2015. [doi]

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