A BIST structure for the evaluation of the MOSFET gate dielectric interface state density in post-processed CMOS chips

Norman Dodel, Stefan Keil, Andreas Wiemhofer, Malte Kortstock, Philipp Scholz, Uwe Kerst, Roland Thewes. A BIST structure for the evaluation of the MOSFET gate dielectric interface state density in post-processed CMOS chips. In Wolfgang Pribyl, Franz Dielacher, Gernot Hueber, editors, st European Solid-State Circuits Conference, Graz, Austria, September 14-18, 2015. pages 412-415, IEEE, 2015. [doi]

@inproceedings{DodelKWKSKT15,
  title = {A BIST structure for the evaluation of the MOSFET gate dielectric interface state density in post-processed CMOS chips},
  author = {Norman Dodel and Stefan Keil and Andreas Wiemhofer and Malte Kortstock and Philipp Scholz and Uwe Kerst and Roland Thewes},
  year = {2015},
  doi = {10.1109/ESSCIRC.2015.7313915},
  url = {http://dx.doi.org/10.1109/ESSCIRC.2015.7313915},
  researchr = {https://researchr.org/publication/DodelKWKSKT15},
  cites = {0},
  citedby = {0},
  pages = {412-415},
  booktitle = {st European Solid-State Circuits Conference, Graz, Austria, September 14-18, 2015},
  editor = {Wolfgang Pribyl and Franz Dielacher and Gernot Hueber},
  publisher = {IEEE},
  isbn = {978-1-4673-7472-9},
}