Lithography-friendly analog layout migration

Xuan Dong, Lihong Zhang. Lithography-friendly analog layout migration. In 2015 IEEE International Symposium on Circuits and Systems, ISCAS 2015, Lisbon, Portugal, May 24-27, 2015. pages 2137-2140, IEEE, 2015. [doi]

@inproceedings{DongZ15-1,
  title = {Lithography-friendly analog layout migration},
  author = {Xuan Dong and Lihong Zhang},
  year = {2015},
  doi = {10.1109/ISCAS.2015.7169102},
  url = {http://dx.doi.org/10.1109/ISCAS.2015.7169102},
  researchr = {https://researchr.org/publication/DongZ15-1},
  cites = {0},
  citedby = {0},
  pages = {2137-2140},
  booktitle = {2015 IEEE International Symposium on Circuits and Systems, ISCAS 2015, Lisbon, Portugal, May 24-27, 2015},
  publisher = {IEEE},
  isbn = {978-1-4799-8391-9},
}