2×2 multimode interference coupler with low loss using 248 nm photolithography

Patrick Dumais, Yuming Wei, Ming Li, Fei Zhao, Xin Tu, Jia Jiang, Dritan Celo, Dominic J. Goodwill, Hongyan Fu, Dongyu Geng, Eric Bernier. 2×2 multimode interference coupler with low loss using 248 nm photolithography. In Optical Fiber Communications Conference and Exhibition, OFC 2016, Anaheim, CA, USA, March 20-24, 2016. pages 1-3, IEEE, 2016. [doi]

Abstract

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