Model-based control of rapid thermal processing for semiconductor wafers - researchr publication authors

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Jon L. Ebert, Dick de Roover, La Moyne L. Porter, V. A. Lisiewicz, Sarbajit Ghosal, Robert L. Kosut, Abbas Emami-Naeini. Model-based control of rapid thermal processing for semiconductor wafers. In Proceedings of the 2004 American Control Conference, ACC 2004, Boston, MA, USA, June 30 - July 2, 2004. pages 3910-3921, IEEE, 2004. [doi]

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