Model-based control of rapid thermal processing for semiconductor wafers

Jon L. Ebert, Dick de Roover, La Moyne L. Porter, V. A. Lisiewicz, Sarbajit Ghosal, Robert L. Kosut, Abbas Emami-Naeini. Model-based control of rapid thermal processing for semiconductor wafers. In Proceedings of the 2004 American Control Conference, ACC 2004, Boston, MA, USA, June 30 - July 2, 2004. pages 3910-3921, IEEE, 2004. [doi]

@inproceedings{EbertRPLGKE04,
  title = {Model-based control of rapid thermal processing for semiconductor wafers},
  author = {Jon L. Ebert and Dick de Roover and La Moyne L. Porter and V. A. Lisiewicz and Sarbajit Ghosal and Robert L. Kosut and Abbas Emami-Naeini},
  year = {2004},
  doi = {10.23919/ACC.2004.1383921},
  url = {https://doi.org/10.23919/ACC.2004.1383921},
  researchr = {https://researchr.org/publication/EbertRPLGKE04},
  cites = {0},
  citedby = {0},
  pages = {3910-3921},
  booktitle = {Proceedings of the 2004 American Control Conference, ACC 2004, Boston, MA, USA, June 30 - July 2, 2004},
  publisher = {IEEE},
  isbn = {0-7803-8335-4},
}