Using neural networks to control the process of plasma etching and deposition

Gamze Erten, Ammar B. A. Gharbi, Fathi M. A. Salam, Timothy A. Grotjohn, Jes Asmussen. Using neural networks to control the process of plasma etching and deposition. In Proceedings of International Conference on Neural Networks (ICNN'96), Washington, DC, USA, June 3-6, 1996. pages 1091-1096, IEEE, 1996. [doi]

Abstract

Abstract is missing.